Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1987-01-08
1989-05-09
Niebling, John F.
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
2041828, G01N 2726
Patent
active
048286702
ABSTRACT:
An electrophoretic support medium and method of making the same are disclosed for use in the analysis of ionizable compounds to be made by subjecting a sample to an electrical potential. The electrophoretic support medium includes a base sheet having at least one negative electrode and at least one positive electrode deposited thereon in a predetermined pattern. A layer of an electrophoretic gel is adhered to the surface of the base sheet, whereby the electrodes are disposed between the base sheet and the electrophoretic gel layer with the electrodes being in electrical contact with the electrophoretic gel layer. In addition, the electrophoretic gel layer may include a plurality of sample wells formed therein in which a sample to be analyzed may be placed. The method includes depositing the electrodes onto the base sheet before adhering the gel layer thereto.
REFERENCES:
patent: 3554894 (1971-01-01), Zemel
patent: 4310407 (1982-01-01), Kaneko et al.
patent: 4443319 (1984-04-01), Chait et al.
Helena Laboratories Corporation
Niebling John F.
Starsiak John S.
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