Electrophoretic positive working photosensitive composition comp

Details Electrophoretic positive working photosensitive composition comp Electrophoretic positive working photosensitive composition comp

1991-10-18

1993-09-07

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430165, 430168, 430169, 430191, 430192, 430193, 430277, 430318, 430326, 430910, G03F 7023, G03F 732

Patent

active

052427803

ABSTRACT:
An electrophoretic positive working photosensitive composition for producing a photoresist pattern on metal base plate comprises a photosensitive compound, in which a photosensitive quinone diazide group is grafted on a polyester, and an acrylic copolymer containing carboxyl group, the composition forms a smooth photoresist film on the plate and has a good adhesion to the surface that no pinehole is found.

REFERENCES:
patent: 3647443 (1972-03-01), Rauner et al.
patent: 3738835 (1972-06-01), Bakos
patent: 4028111 (1977-06-01), Iwasaki et al.
patent: 4681923 (1987-07-01), Demmer
patent: 4763458 (1987-06-01), Ishikawa
patent: 4975351 (1990-12-01), Akaki et al.
patent: 5055374 (1991-10-01), Seio et al.

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