Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1986-06-26
1987-04-07
Demers, Arthur P.
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
2041801, 204301, B01D 1302
Patent
active
046558985
ABSTRACT:
Electrophoretic fractionation apparatus well adopted for separating solutions containing diverse substances dissolved therein, e.g., such proteinaceous solutions as human plasma, is comprised of (i) a pair of opposed end plates, (ii) a pair of opposed electrodes, (iii) a pair of opposed frame members, (iv) at least two spaced membranes, said frame members, electrodes and membranes defining open electrode compartments between said end plates, and said frame members comprising inlet and outlet means for introducing and withdrawing an ionic solution into and from the central region of said electrode compartments, and (v) at least one fractionation plate disposed between said at least two membranes, and each said fractionation plate (v) comprising (1) at least one elongate slit extending through the thickness thereof and said slit defining, together with two of said spaced membranes, at least one solution fractionation chamber, (2) means for introducing solution to be fractionated into said at least one fractionation chamber, (3) means for withdrawing one fraction of fractionated solution from one end region of said fractionation chamber, and (4) means for withdrawing another fraction of fractionated solution from another end region of said fractionation chamber.
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Lafaille Jean-Pierre
Poulhes Marie-Andree
Pourrat Jacques
Sanchez Victor
Demers Arthur P.
Rhone-Poulenc Recherches
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