Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1991-11-29
1993-03-09
Niebling, John
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
2041828, G01N 2726
Patent
active
051924129
ABSTRACT:
An electrophoretic apparatus includes an electrophoresis panel having a fluted glass plate and a non-fluted plane plate. The fluted glass plate is provided with a plurality of substantially parallel narrow electrophoresis grooves and a groove intersecting the electrophoresis grooves for laser beam irradiation. The fluted glass plate and the non-fluted plane plate are closely superposed on each other to form many capillaries adapted to be filled with gel to thereby form many electrophoresis lanes. The electrophoretic apparatus further includes a light measuring instrument to measure fluorescence images at positions which are subjected to laser beam irradiation. Passage of fluorescently labeled sampled fragments through the laser beam irradiation positions in each electrophoresis lane is detected by measuring a change of fluorescence emission with time.
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patent: 3766047 (1973-10-01), Elevitch
patent: 4374723 (1983-02-01), Vesterberg
patent: 4675095 (1987-06-01), Kambara et al.
patent: 4832815 (1989-05-01), Kambara et al.
patent: 5062942 (1991-11-01), Kambara et al.
Drossman et al., "High-Speed Separations of DNA Sequencing Reactions by Capillary Electrophoresis", Analytical Chemistry, vol. 62, No. 9, 1990, pp. 900-903.
Kambara Hideki
Nagai Keiichi
Hitachi , Ltd.
Niebling John
Ryser David G.
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