Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1980-05-21
1982-01-12
Prescott, Arthur C.
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
204180S, 204180G, G01N 2728, G01N 2730, G01N 2726
Patent
active
043104070
ABSTRACT:
An electrophoretic apparatus comprising three electrode chambers serially arranged and filled with buffer solutions respectively, electrodes arranged in said electrode chambers respectively, three filter paper supports arranged above the spaces between the respective electrode chambers and above the central electrode chamber, a filter paper mounted on the central filter paper support and having both ends dipped into the buffer solution contained in the central electrode chamber and filter papers mounted on the other two filter paper supports and dipped at one end into the buffer solutions contained in the other electrode chambers. Said electrophoretic apparatus is so adapted as to form electrophoretic patterns of respective sera by electrically energizing a carrier onto which the sera are applied in two rows and which is mounted on said filter paper supports.
REFERENCES:
patent: 3421998 (1969-01-01), Yallen
patent: 3494846 (1970-02-01), Arquembourg
patent: 3764513 (1973-10-01), Saravis
patent: 3896021 (1975-07-01), Fosslien
patent: 3932263 (1976-01-01), Brefka
patent: 4059501 (1977-11-01), Strickler
patent: 4087346 (1978-05-01), Kitahara
patent: 4190517 (1980-02-01), Monthony et al.
Kamachi Shin-ichi
Kaneko Nobutaka
Olympus Optical Co,. Ltd.
Prescott Arthur C.
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