Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1985-11-22
1987-07-14
Valentine, Donald R.
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
2041829, 2041828, C25D 1300, G01N 2100
Patent
active
046801022
ABSTRACT:
An electrophoretic apparatus for effecting an electrophoresis by conducting an electrophoretic current through a substrate on which a sample has been applied, while the substrate is maintained in a wetted condition with a buffer solution includes a device for detecting a variation of an expansion length of fraction images and a device for controlling a condition of the electrophoretic operation. Further a condition of the buffer solution is monitored and the buffer solution is fully or partially replaced by a fresh buffer solution.
REFERENCES:
patent: 3616457 (1971-10-01), Hjerten et al.
patent: 3909380 (1975-09-01), Day et al.
patent: 4234400 (1980-11-01), Kaplan et al.
patent: 4310407 (1982-01-01), Kaneko et al.
Olympus Optical Co,. Ltd.
Valentine Donald R.
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