Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1990-12-18
1992-04-14
Niebling, John
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
2041801, 356344, B01D 6142, B01D 5702
Patent
active
051045117
ABSTRACT:
In an electrophoresis system, a specimen is analyzed on the basis of a division image obtained by applying the specimen on a substrate and causing an electrophoresis phenomenon to occur. The electrophoresis system comprises a refractometer for measuring the total protein amount of said specimen, a mechanism for applying the specimen onto the head surface of the refractometer, a mechanism for cleaning the head surface of the refractometer, and memory and processing sections for storing the measured data and performing the arithmetic processing with the data obtained on the basis of the division image.
REFERENCES:
patent: 4578169 (1986-03-01), Vicario et al.
Kaneko Nobutaka
Suzuki Hideo
Watanabe Sadahiro
Yamamoto Akihiko
Koestner Caroline
Niebling John
Olympus Optical Co,. Ltd.
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