Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1991-04-08
1994-08-30
Niebling, John
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
323250, 323331, 323362, C25B 900
Patent
active
053424972
ABSTRACT:
The invention provides an electrophoresis system which separates charged chemical substances by means of applying an electrical potential across a buffer solution which includes those chemical substances. The system of the invention includes a power supply and control system which has a wide dynamic range of constant voltage, current and power which may be supplied, and is therefore particularly suited to the needs of the electrophoresis system. In the invention, the power supply includes a flyback topology and a control system which allows an operator to specify a wide range of constant voltage, current or power supply requirements for the electrophoresis system.
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Designing With Field-Effect Transistors, Siliconix, 1981: "Voltage-Controlled Resistors and Fet Current Sources", Chapter 6 (6-1-6-2), pp. 233-242.
Cathel Frank
Leshofs Robert
Delacroix-Muirheid C.
Niebling John
Stratagene Cloning Systems
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