Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1989-02-22
1990-12-04
Niebling, John F.
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
2041838, G01N 2726, B01D 5702
Patent
active
049751735
ABSTRACT:
An electrophoresis plate of the type including a base layer of an electrophoretic medium containing some buffer material and a method of making such an electrophoresis plate. On the base layer of the plate there are formed buffer blocks made up of an electrophoretic medium having a lower electroendosmotic potential than that of the base layer. The buffer blocks contain buffer material for functioning as a self-contained reservoir during electrophoresis. The method of the present invention includes continuous casting of the buffer blocks and also includes casting the buffer blocks as a sequence of discrete layers.
REFERENCES:
patent: 3432414 (1969-03-01), Rand
patent: 3432424 (1969-03-01), Zec
patent: 3479265 (1969-11-01), Elevitch
patent: 3674678 (1972-07-01), Post, Jr. et al.
patent: 3751357 (1973-08-01), Rains
patent: 3764513 (1973-10-01), Saravis
patent: 4874491 (1989-10-01), St.ang.lberg
patent: 4892639 (1990-01-01), Sarrine et al.
Guadagno Philip A.
Tansamrit Subphong
Helena Laboratories Corporation
Niebling John F.
Starsiak Jr. John S.
LandOfFree
Electrophoresis plate and method of making same does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Electrophoresis plate and method of making same, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Electrophoresis plate and method of making same will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-881801