Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1987-07-17
1990-01-09
Niebling, John F.
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
2041828, G01N 2728, G01N 2726
Patent
active
048926396
ABSTRACT:
An improved electrophoresis plate and method of making same includes a plate having an inert substrate and an electrophoretic medium formed on the substrate. The electrophoretic medium includes, as a part thereof, buffer blocks or buffer reservoirs, more specifically, relatively thick deposits of the electrophoretic medium. The electrophoretic medium buffer is positioned in a predetermined location relative to alignment apertures in the substrate.
The method of making the electrophoresis plate of the present invention includes priming the substrate with electrophoretic medium and thereafter forming, such as by casting or molding, the electrophoretic medium with the buffer blocks on the primed substrate.
REFERENCES:
patent: 3432414 (1969-03-01), Rand
patent: 3432424 (1969-03-01), Zec
patent: 3479265 (1969-11-01), Elevitch
patent: 3674678 (1972-07-01), Post, Jr. et al.
patent: 3751357 (1973-08-01), Rains
patent: 3764513 (1973-10-01), Saravis
Garsee Henry A.
Guadagno Philip A.
Sarrine Robert J.
Helena Laboratories Corporation
Niebling John F.
Starsiak Jr. John S.
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