Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1990-03-23
1991-10-08
Tung, T.
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
204228, 2041828, G01N 2726
Patent
active
050551728
ABSTRACT:
The invention provides an electrophoresis system which separates charged chemical substances by means of applying an electrical potential across a buffer solution which includes those chemical substances. The system of the invention includes a power supply and control system which has a wide dynamic range of constant voltage, current and power which may be supplied, and is therefore particularly suited to the needs of the electrophoresis system. In the invention, the power supply includes a flyback topology and a control system which allows an operator to specify a wide range of constant voltage, current or power supply requirements for the electrophoresis system.
REFERENCES:
patent: 3915827 (1975-10-01), Davies
patent: 4068677 (1978-01-01), De Steur et al.
patent: 4870327 (1989-09-01), Jorgensen
patent: 4891103 (1990-01-01), Zorinsky et al.
Cathel Frank
Leshofs Robert
Ryser David G.
Stratagene Cloning Systems
Tung T.
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