Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1980-02-20
1982-01-12
Prescott, Arthur C.
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
204180R, 204180P, 204299R, G01N 2726, G01N 2740
Patent
active
043104088
ABSTRACT:
A continuous free-flow electrophoresis chamber construction is provided which includes a coolant chamber employing coolant flow in a direction that traverses the flow of buffer carried in a buffer chamber. The construction further employs large area membranes separating first and second electrodes from the buffer flow chamber. The coolant flow chamber communicates with the buffer flow chamber along the membranes.
REFERENCES:
patent: 3412008 (1968-11-01), Strickler
patent: 3450624 (1969-06-01), Natelson
patent: 3902986 (1975-09-01), Nees
Richman David W.
Rose Alan L.
Lucchesi Lionel L.
McDonnell Douglas Corporation
Prescott Arthur C.
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