Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1990-11-06
1992-04-21
Niebling, John
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
2041801, B01D, B01D 5702
Patent
active
051064774
ABSTRACT:
A fluid circulation apparatus for an electrophoresis device is disclosed. The fluid circulation device has an electrode gas retaining means communicating with the two reservoirs of the electrophoresis device. The electrode gas retaining means is disposed to trap electrode produced gas at a level below the fluid level in the remainder of the electrophoresis device so that fluid in the electrode gas retaining means has a pressure head greater than the pressure at the fluid level in the remainder of the electrophoresis device. The resulting fluid pressure differential causes the fluid flow between the two reservoirs of the electrophoresis device through the electrode gas retaining means.
REFERENCES:
patent: 3104221 (1963-09-01), Hill
patent: 4588491 (1986-05-01), Kreisher
patent: 4702814 (1987-10-01), Audeh
Genelex Corporation
Jackson Larry A.
Johnson John M.
Koestner Caroline
Niebling John
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