Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1982-05-24
1983-07-19
Warren, Charles F.
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
204180P, G01N 2726, G01N 2740
Patent
active
043942466
ABSTRACT:
This free flow electrophoresis separation apparatus includes means for controlling the buffer flow across the separation chamber. This is useful in controlling crescent distortion of the sample streams as well as minimizing undesired pressure differentials within the apparatus. The electrophoresis separation apparatus is constructed such that two buffer flow paths are provided. The first flow path connects the outlet of the first electrode chamber with the inlet of the second inlet chamber, and the second flow path connects the outlet of the second electrode chamber with the inlet of the first electrode chamber. Each flow path is driven by separate pump means.
REFERENCES:
patent: 3829370 (1972-03-01), Bourat
patent: 4309268 (1982-01-01), Richman
Richman David W.
Walker Charles D.
Cone Gregory A.
Finch George W.
McDonnell Douglas Corporation
Rooney Gerard P.
Royer Donald L.
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