Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1985-01-25
1986-11-25
Niebling, John F.
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
2041828, G01N 2728
Patent
active
046247688
ABSTRACT:
A horizontal electrophoresis apparatus characterized by a cooling plate which consists of a sintered SiC with high thermal conductivity and good insulating properties, or sintered material composed mainly of SiC, and a Peltier element, as the heat conducting material to cool the supporting matrix or electrolyte.
Itoh Michio
Maeda Kunihiro
Yoshida Motoko
Boggs Jr. B. J.
Hitachi , Ltd.
Niebling John F.
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