Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1992-01-14
1993-09-07
Niebling, John
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
2041828, G01N 2726, G01N 27447, B01D 5702
Patent
active
052425681
ABSTRACT:
Electrophoresis apparatus comprising a base including a water jacket, a generally horizontal bottom plate having an upper surface, and a lower surface which is supported by the base and which extends over the water jacket, an endless gasket having a lower surface engaging the upper surface of the bottom plate, and having an upper surface, and a generally horizontal top plate having a lower surface seated on the upper surface of the gasket so as to define between the plates and inside the gasket a space adapted to contain a separation medium.
REFERENCES:
patent: 3047489 (1962-07-01), Raymond
patent: 3751357 (1973-08-01), Rains
patent: 3819505 (1974-06-01), Parent et al.
patent: 3888759 (1975-06-01), Elson et al.
patent: 4061561 (1977-12-01), Fletcher et al.
patent: 4130471 (1978-12-01), Grunbaum
patent: 4151065 (1979-04-01), Kaplan et al.
patent: 4385974 (1983-05-01), Shevitz
patent: 4588491 (1986-05-01), Kreisher et al.
patent: 4608146 (1986-08-01), Penaluna
patent: 4657655 (1987-04-01), Smoot et al.
patent: 4830725 (1989-05-01), Berninger et al.
patent: 5137613 (1992-11-01), Brumley, Jr. et al.
Robert L. Brumley, Jr. and Lloyd M. Smith, "Rapid DNA sequencing by horizontal ultrathin gel electrophoresis" Nucleic Acids Research, vol. 19, No. 15 (1991) 4121-4126.
Ehr Timothy G. J.
Gorski Stephen H.
Vitek Richard K.
Fotodyne Incorporated
Niebling John
Starsiak Jr. John S.
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