Electroosmotic pump using nanoporous dielectric frit

Active solid-state devices (e.g. – transistors – solid-state diode – Housing or package – With provision for cooling the housing or its contents

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C257S712000, C257S714000, C438S042000

Reexamination Certificate

active

07667319

ABSTRACT:
An electroosmotic pump may be fabricated using semiconductor processing techniques with a nanoporous open cell dielectric frit. Such a frit may result in an electroosmotic pump with better pumping capabilities.

REFERENCES:
patent: 5494858 (1996-02-01), Gnade et al.
patent: 6225223 (2001-05-01), Liu et al.
patent: 6596988 (2003-07-01), Corso et al.
patent: 6720710 (2004-04-01), Wenzel et al.
patent: 6878567 (2005-04-01), Winer et al.
patent: 6905031 (2005-06-01), Miller et al.
patent: 2003/0089605 (2003-05-01), Timperman
patent: 2003/0232203 (2003-12-01), Mutlu et al.
Chinese Patent Office, Office Action for Chinese Application No. 200480008679.3, 10 pages, Aug. 22, 2008.
Micromachine and microprocessing technic) pp. 59-60, Aug. 31, 2000.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Electroosmotic pump using nanoporous dielectric frit does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Electroosmotic pump using nanoporous dielectric frit, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Electroosmotic pump using nanoporous dielectric frit will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4165088

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.