Electrooptical device region and manufacturing method...

Details Electrooptical device region and manufacturing method... Electrooptical device region and manufacturing method...

2005-01-12

2008-10-14

Caley, Michael H (Department: 2871)

Liquid crystal cells, elements and systems

Particular excitation of liquid crystal

Electrical excitation of liquid crystal

C349S047000, C349S144000, C345S107000, C359S296000

Reexamination Certificate

active

07436465

ABSTRACT:
A region of an electrooptical device includes a substrate, an active matrix switching element formed on the substrate and a pixel electrode formed on the substrate and having a first pixel electrode coupled to the switching element AM and a second pixel electrode covering a second switching element coupled to a third electrode.

REFERENCES:
patent: 6281952 (2001-08-01), Okamoto et al.
patent: 6300988 (2001-10-01), Ishihara et al.
patent: 6563554 (2003-05-01), Okamoto et al.
patent: 6900863 (2005-05-01), Okamoto et al.
patent: 7050132 (2006-05-01), Okamoto et al.
patent: 2001/0022633 (2001-09-01), Kwak et al.
patent: 2003/0147019 (2003-08-01), Sasaki
patent: 2006/0119752 (2006-06-01), Okamoto et al.
patent: 11-242226 (1999-09-01), None
patent: 2002-353167 (2002-12-01), None
patent: 2003-508807 (2003-03-01), None
T. Kawase et al., “Inkjet printing of polymer thin film transistors,” Thin Solid Films 438-439 (2003) 279-287.
T. Kawase et al., “All-polymer thin film transistors fabricated by high-resolution ink-jet printing,” 2000 International Electron Device Meeting Technical Digest, pp. 623-626.

Affiliated with

Also associated with

Rating

Electrooptical device region and manufacturing method... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Electrooptical device region and manufacturing method..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Electrooptical device region and manufacturing method... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4006010