Electrooptical device, method of manufacturing the same, and...

Details Electrooptical device, method of manufacturing the same, and... Electrooptical device, method of manufacturing the same, and...

2005-02-15

2005-02-15

Ton, Toan (Department: 2871)

Liquid crystal cells, elements and systems

Particular excitation of liquid crystal

Electrical excitation of liquid crystal

C349S147000, C349S110000

Reexamination Certificate

active

06856360

ABSTRACT:
An AMLCD having high fineness and high contrast is realized. First, an interlayer film is provided on an element electrode, and an opening portion is formed in the interlayer film. Next, after a first metal layer is formed, an embedded insulating layer is formed. The embedded insulating layer is retreated by a means, such as an etch back method, to realize a state in which only the opening portion is filled with the embedded insulating layer. By this, electric connection between the element electrode and a second metal layer becomes possible while keeping the flatness.

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