Radiant energy – With charged particle beam deflection or focussing – Magnetic lens
Reexamination Certificate
2005-10-26
2008-11-04
Vanore, David A. (Department: 2881)
Radiant energy
With charged particle beam deflection or focussing
Magnetic lens
C250S397000, C250S398000
Reexamination Certificate
active
07446320
ABSTRACT:
One embodiment relates to an electronically-variable electrostatic immersion lens in an electron beam apparatus. The electrostatic immersion lens includes a top electrode configured with a first voltage applied thereto, an upper bottom electrode configured with a second voltage applied thereto, and a lower bottom electrode configured with a third voltage applied thereto. The third voltage is controlled separately from the second voltage. Other embodiments are also disclosed.
REFERENCES:
patent: 3896258 (1975-07-01), Hanks
patent: 4827125 (1989-05-01), Goldstein et al.
patent: 5146089 (1992-09-01), Rosien
patent: 5598002 (1997-01-01), Todokoro et al.
patent: 5717204 (1998-02-01), Meisburger et al.
patent: 5973323 (1999-10-01), Adler et al.
patent: 6087659 (2000-07-01), Adler et al.
patent: 6104034 (2000-08-01), Frosien et al.
patent: 6191429 (2001-02-01), Suwa
patent: 6211518 (2001-04-01), Richaardson et al.
patent: 6215128 (2001-04-01), Mankos et al.
patent: 6380546 (2002-04-01), Petrov et al.
patent: 6392231 (2002-05-01), Chen
patent: 6407387 (2002-06-01), Frosien et al.
patent: 6509750 (2003-01-01), Talbot et al.
patent: 6515287 (2003-02-01), Notte, IV
patent: 6710340 (2004-03-01), Kazumori
patent: 6720557 (2004-04-01), Frosien
patent: 6858843 (2005-02-01), Mankos et al.
Min Cheng, et al. “Optimization design of immersion magnetic lenses in projection electron beam lithography” International Journal for light and electron optics; Jan. 24, 2001, pp. 149-151; Jiaotong University. P.R. China.
Min Cheng, et al. “Study on wide beam curved optical axes focusing for magnetic immersed lenses without crossovers” International Journal for light and electron optics; May 28, 2000, pp. 509-513; Jiaotong University, P.R. China.
Min Cheng, et al. “Curvilinear-axis focusing and aberration theory of wide electron beams for combined immersion magnetic-electrostatic lens systems” International Journal of light and electron optics; Feb. 5, 2001 pp. 259-267; Jiaotong University, P.R. China.
M. Mankos, et al. “Multisource optimization of a column for electron lithography” J.Vac. Sci. Technology B, Nov./Dec. 2000, pp. 3010-3016, vol. 18, No. 6; Etec Systems, Hayward, California U.S.A.
Bertsche Kirk J.
Machuca Francisco
McCord Mark A.
KLA-Tencor Technologies Corproation
Okamoto & Benedicto LLP
Vanore David A.
LandOfFree
Electronically-variable immersion electrostatic lens does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Electronically-variable immersion electrostatic lens, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Electronically-variable immersion electrostatic lens will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4024818