Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1978-10-10
1980-11-25
Tufariello, T. M.
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
204186, C10G 3302, B03C 500
Patent
active
042356989
ABSTRACT:
Disclosed is an electronic fluid treatment device for use in circulating fluid systems for controlling and removal of scale materials. This device includes a series of electrodes in the form of parallel metal sheets. Alternate electrodes are oppositely charged by a low voltage DC power supply thereby generating an electric field between adjacent electrodes. By passing the fluid through this electric field, any mineral particles in the fluid are electrically modified thereby inhibiting crystal growth and agglomeration which results in scale deposits on the inner walls of circulating systems. The planar metal electrodes are directly exposed to the fluid with the planar configuration allowing maximum exposure to the electric field. The metal electrodes may be placed on a support so as to be parallel to the flow of the fluid or longitudinal therewith, using perforated, expanded, or screen mesh metal planar electrodes. The parallel plate electrode configuration may be utilized in both a pressure system by enclosing the parallel plates in a rectangular conduit or in an open circulating fluid system as for example a cooling tower basin.
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Hydrotreat, Inc.
Tufariello T. M.
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