Electronic optical objective

Radiant energy – With charged particle beam deflection or focussing – Magnetic lens

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313431, 315391, G21K 108

Patent

active

043307094

ABSTRACT:
An electronic optical objective applicable to electrolithographic devices for microlithography in particular in semiconductor and integrated circuits fabrication. The objective comprises an electromagnetic lens formed by two polepieces, one of which is of soft iron and the other of ferrite, spaced from each other by an airgap. It further comprises two deflectors, one of which is placed in a longitudinal zone of weak magnetic field and the other is placed in a longitudinal zone of strong magnetic field. These two deflectors are identical and offset from each other by a certain angle, for example from 215.degree. to 225.degree..

REFERENCES:
patent: 3736423 (1973-05-01), Katagiri
patent: 3801792 (1974-04-01), Lin
patent: 4162403 (1979-07-01), Baumgarten

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