Electronic device process apparatus

Details Electronic device process apparatus Electronic device process apparatus

1996-11-19

1998-03-03

Stinson, Frankie L.

Cleaning and liquid contact with solids

Apparatus

Automatic controls

134 57R, 134113, 134 953, 134902, 134111, B08B 302

Patent

active

057224412

ABSTRACT:
A process apparatus for processing semiconductor wafers. It includes a process vessel in which process solution is contained. In the process solution, the wafers are immersed and processed. A supply pipe extends from the process vessel to solution storing vessels. Component solutions are stored in the component solution storing vessels and supplied from them to the process vessel to keep the concentration of each component in process solution. A supply pump is attached to the supply pipe. Valves for adjusting the amount of each component supplied are attached to the supply pipe. The adjusting valves are electrically connected to a CPU. Data representing that concentration of each component in process solution which changes with passage of time are previously stored in the CPU. The CPU controls the adjusting valves on the basis of the data to supply component solutions into the process vessel so as to meet any change in the concentration of each component in process solution in the process vessel. The concentration of each component in process solution can be thus kept to be a predetermined value. This enables the wafers in every batch to be uniformly washed.

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