Coating apparatus – Gas or vapor deposition – With treating means
Patent
1997-05-15
2000-11-07
Mills, Gregory
Coating apparatus
Gas or vapor deposition
With treating means
118728, 204298, 204192, 216 67, C23C 16509
Patent
active
061420964
ABSTRACT:
An electronic device manufacturing apparatus includes: a reaction chamber including a wall having a ground potential level; a reaction gas inlet for introducing a reaction gas into the reaction chamber; a high frequency power generator for generating a high frequency voltage for exciting the reaction gas into plasma state or dissociated state; a cathode electrode connected to the high frequency power generator; and a floating capacitance formed between a potential level of the cathode electrode and the ground potential level. An impedance adjusting capacitor is inserted so as to be in series with the floating capacitance. The impedance adjusting capacitor has a capacitance value less than that of the floating capacitance.
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Nomoto Katsuhiko
Sakai Osamu
Mills Gregory
Sharp Kabushiki Kaisha
Zervigon Rudy
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