Coating apparatus – Gas or vapor deposition – With treating means
Reissue Patent
2006-04-18
2006-04-18
Zervigon, Rudy (Department: 1763)
Coating apparatus
Gas or vapor deposition
With treating means
C118S728000, C156S345430, C156S345440, C156S345450, C216S067000
Reissue Patent
active
RE039064
ABSTRACT:
An electronic device manufacturing apparatus includes: a reaction chamber including a wall having a ground potential level; a reaction gas inlet for introducing a reaction gas into the reaction chamber; a high frequency power generator for generating a high frequency voltage for exciting the reaction gas into plasma state or dissociated state; a cathode electrode connected to the high frequency power generator; and a floating capacitance formed between a potential level of the cathode electrode and the ground potential level. An impedance adjusting capacitor is inserted so as to be in series with the floating capacitance. The impedance adjusting capacitor has a capacitance value less than that of the floating capacitance.
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Nomoto Katsuhiko
Sakai Osamu
Nixon & Vanderhye P.C.
Zervigon Rudy
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