Active solid-state devices (e.g. – transistors – solid-state diode – Combined with electrical contact or lead – Of specified material other than unalloyed aluminum
Patent
1996-04-24
1998-09-08
Ngo, Ngan V.
Active solid-state devices (e.g., transistors, solid-state diode
Combined with electrical contact or lead
Of specified material other than unalloyed aluminum
257354, 257751, 257763, 257765, H01L 2348, H01L 2352, H01L 2940
Patent
active
058048782
ABSTRACT:
An electronic circuit formed on an insulating substrate and having thin-film transistors (TFTs) comprising semiconductor layers. The thickness of the semiconductor layers is less than 1500 .ANG., e.g., between 100 and 750 .ANG.. A first layer consisting mainly of titanium and nitrogen is formed on the semiconductor layer. A second layer consisting aluminum is formed on top of first layer. The first and second layers are patterned into conductive interconnects. The bottom surface of the second layer is substantially totally in intimate contact with the first layer. The interconnects have good contacts with the semiconductor layer.
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Cui Baochun
Miyazaki Minoru
Murakami Akane
Yamamoto Mutsuo
Costellia Jeffrey L.
Ferguson Jr. Gerald J.
Ngo Ngan V.
Semiconductor Energy Laboratory Co,. Ltd.
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