Electronic beam drawing apparatus

Details Electronic beam drawing apparatus Electronic beam drawing apparatus

1989-03-27

1991-01-08

Anderson, Bruce C.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

250397, H01J 3730

Patent

active

049838644

ABSTRACT:
An electron beam drawing apparatus having a grounded conductor for a screening operation in the neighborhood of a detection surface of a detector to detect a reflected electrons obtained by irradiating an electron onto a specimen and a secondary electron generated through the electron irradiation. The conductor has openings to pass therethrough the reflected electron and the secondary electron. As a result, the electric charge accumulated on an organic substance fixed onto the front surface of the detector through the electron irradiation is prevented from exerting an influence on the drawing electron beam.

REFERENCES:
patent: 4812651 (1989-03-01), Feuerbaum et al.
patent: 4829177 (1989-05-01), Hirsch
patent: 4857742 (1989-08-01), Kato et al.
T. H. Newman, et al., "High Resolution Patterning System with Single Bore Object Lens", Journal of Vacuum Science and Technology, B vol. 5, No. 1, Jan./Feb. 1987, pp. 88-91, (in English).
J. C. Edison, et al., "A High Speed Electron Beam Lithography System", Journal of Vacuum Science and Technology, 19(4), Nov./Dec. 1981, pp. 932-935, (in English).

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