Electron tunneling device using ferromagnetic thin films

Dynamic information storage or retrieval – Specific detail of information handling portion of system – Electrical modification or sensing of storage medium

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369120, 365158, 360113, 257421, G11B 900, G11C 1115, H01L 2722

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056299222

ABSTRACT:
Ferromagnetic/insulator/ferromagnetic tunneling has been shown to give over 10% change in the junction resistance with H less than 100 Oe, at room temperature but decreases at high dc-bias across the junction. Using such junctions as magnetic sensors or memory elements would have several advantages; it is a trilayer device and does not strongly depend on the thickness of FM electrodes or the tunnel barrier; submicron size is possible with high junction resistance and low power dissipation. The magnitude of the effect is consistent with the simple model of spin-polarized tunneling between ferromagnets.

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Yaoi, T. et al., "Dependence of Magnetoresistance on Temperature and Applied Voltage in a 82Ni-Fe/Al-Al.sub.2 O.sub.3 /Co Tunneling Junction," Journal of Magnetism and Magnetic Materials, 126:430-432 (1993).
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