Electron source manufacturing method

Details Electron source manufacturing method Electron source manufacturing method

2009-08-20

2011-12-13

Hines, Anne (Department: 2879)

Electric lamp or space discharge component or device manufacturi

Process

Electrode making

C445S046000, C445S058000

Reexamination Certificate

active

08075361

ABSTRACT:
A constitution that conductive members respectively having micropatterns are arranged in high density is manufactured in high accuracy. A conductive film is formed on a substrate, a negative photosensitive resin is applied, the applied resin is exposed by using a first mask having plural fine-width apertures extending in Y direction, and the resin is then exposed and developed by using a second mask having plural apertures extending in X direction perpendicular to Y direction, thereby forming a first resist. After the conductive film is etched by using the first resist as a mask, a negative photosensitive resin is again applied, and exposure and development are performed as shifting the second mask in Y direction, thereby forming a second resist. The conductive film is etched by using the second resist as a mask to eliminate unnecessary areas, thereby forming the conductive film having minute-lines extending in Y direction.

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