Electron source having a material-retaining device

Details Electron source having a material-retaining device Electron source having a material-retaining device

1991-10-10

1993-10-26

Yusko, Donald J.

Electric lamp and discharge devices

With positive or negative ion acceleration

Plural apertured electrodes

31323131, 31323141, 3133631, 31511121, 31511131, 31511181, H05H 103

Patent

active

052569314

ABSTRACT:
The present invention relates to a vacuum arc electron source having an anode and a cathode facing each other such that they produce a plasma (P) after an appropriate voltage difference has been applied between the anode and the cathode, an electron extractor device (30) and a material-retaining device arranged between the extractor device and the plasma source. According to the invention, the material-retaining device comprises, arranged in the electron extraction direction (F), at least one upstream baffle (10) and a downstream baffle (20) which are each electrically conducting and have apertures (16, 26) arranged in quincunx, such that when the baffles (10, 20) are adjusted a given potential, the plasma (P) does not extend to downstream of the downstream baffle (20).

REFERENCES:
patent: 4507588 (1985-03-01), Asmussen et al.
patent: 4924138 (1990-05-01), Bernardet
patent: 4939425 (1990-07-01), Bernardet
patent: 5107170 (1992-04-01), Ishikawa et al.
"Grid Controlled Plasma Cathodes" Humphries et al J. Appl. Phys. 57(3) Feb. 1, 1985, pp. 709-713.

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