Electron sensitive resist and a method preparing the same

Details Electron sensitive resist and a method preparing the same Electron sensitive resist and a method preparing the same

1978-04-03

1979-05-29

Newsome, John H.

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

96 351, 96115R, 20415922, 427273, B05D 306

Patent

active

041567455

ABSTRACT:
A high speed high contrast electron resist composition comprising a copolymer of polymethylmethacrylate/methacrylic acid having incorporated therein a metal selected from the group consisting of lead, barium, calcium and strontium is disclosed. The metal is present in the range of from about 0.001% to about 10% by weight of the copolymer.

REFERENCES:
feder et al., I "IBM Tech. Disc. Bull." 18, 7 (1975) pp. 2346, 7.
Brault "Chem. Abstr." 83, 35630 (1975).
Hiraoka et al. "IBM Tech. Disc. Bull." 20, 5 (1977) p. 1922.
Feder et al. II "IBM Tech. Disc. Bull." 18, 7 (1975) pp. 2343, 4, 5.
Rohm and Haas "Chem. Abstr." 71, 22606 (1969).

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