Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – Polymers from only ethylenic monomers or processes of...
Patent
1978-10-27
1981-05-26
Smith, Ronald H.
Synthetic resins or natural rubbers -- part of the class 520 ser
Synthetic resins
Polymers from only ethylenic monomers or processes of...
101457, 101470, 428462, 430288, 430296, 430287, B41N 108, G03F 710, C08F22020, C08F23614
Patent
active
042699622
ABSTRACT:
The invention relates to a negative electron resist for application in electron lithography. It consists of an organic copolymer formed by copolymerization of butadiene or isoprene with glycidyl acrylate or glycidyl methacrylate. The resist exhibits the high sensitivity to irradiation by electrons and, at the same time, a good adhesion to the base and a resistance towards common etching agents. The copolymer is advantageously prepared by radical polymerization and a high purity of the product does not require further purification. The electron resist manufactured in this way has the long-term workability.
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Bednar Bohumil
Kalal Jaroslav
Pelcbauer Zdenek
Petr Jiri
Svec Frantisek
Ceskoslovenska akademie ved
Page Thurman K.
Smith Ronald H.
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