Electron-optical system exhibiting reduced aberration

Details Electron-optical system exhibiting reduced aberration Electron-optical system exhibiting reduced aberration

1998-07-08

2000-05-23

Anderson, Bruce C.

Radiant energy

With charged particle beam deflection or focussing

With target means

25049223, 250396ML, H01J 3730

Patent

active

060668539

ABSTRACT:
Electron-optical systems are disclosed in having operating parameters that are quantitatively optimized in a short period of time. The systems comprise multiple deflectors that diminish off-axis aberrations. The deflectors are situated in a two-stage projection lens. The dimensions of the main field which in subfields are selected by electron-beam deflection are set to 10 mm or less. The dimensions of each transfer subfield on the surface of the substrate are set to (500 .mu.m).sup.2 to (750 .mu.m).sup.2, and the mask-to-specimen distance is set to 600 mm or less.

REFERENCES:
patent: 5635719 (1997-06-01), Petric
patent: 5689117 (1997-11-01), Naksuji
patent: 5747819 (1998-05-01), Nakasuji
patent: 5757010 (1998-05-01), Langner
patent: 5773837 (1998-06-01), Nakasuji
patent: 5773838 (1998-06-01), Nakasuji
patent: 5793048 (1998-08-01), Petric et al.
patent: 5912469 (1999-06-01), Okino
Hosokawa, "Practical Feasibility of the Multistage Deflection Theory," J. Vac. Sci. Technol. 13:1050-1054 (1995).

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