Electron impact ion source for trace analysis

Details Electron impact ion source for trace analysis Electron impact ion source for trace analysis

1983-03-04

1986-04-01

Freeh, William L.

Fluid handling

Systems

With pump

417 48, 417295, F04B 3714, F04B 3700, H01J 4702

Patent

active

045791449

ABSTRACT:
An apparatus is disclosed for analyzing trace elements in a gas sample. An unique feedback system is provided for accurately regulating and sensing the pressure supplied to the ion chamber of the device. The feedback system is capable of compensating for a wide range of input gas pressures. The apparatus also includes an improved closed ion source which is resistant to corrosion and aids in the reduction of noise. In addition, a method is disclosed to calibrate the detector for accurately scaling the measurements of trace elements.

REFERENCES:
patent: 2653620 (1953-09-01), Morgan
patent: 3050622 (1962-08-01), Boyer et al.
patent: 3942546 (1976-03-01), Radd
patent: 4137750 (1979-02-01), French et al.
patent: 4156814 (1979-05-01), Hunt et al.
patent: 4213326 (1980-07-01), Brodasky
patent: 4368388 (1983-01-01), Blyth
patent: 4383171 (1983-05-01), Sinha et al.

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