Electron image projector

Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices

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2504911, H01J 3700

Patent

active

047059567

ABSTRACT:
A step-and-repeat electron image projector for transferring mask patterns repeatedly from a photoemissive cathode reticle (1) onto a target (3) with high resolution capabilities. Accelerated by a uniform electric field E and focussed by a uniform magnetic field H, a patterned electron beam is projected from the reticle (1) onto an area of the target with unity magnification. The electric field E is established between the cathode reticle and an electron permeable anode grid (2) situated between the cathode reticle and the target. Alignment of the beam and the target is effected by detecting electrons backscattered from reference markers (30) on the target with a backscattered electron detector (D) being located between the grid and the target. After exposing one area, the target is moved stepwise on an X-Y table (100) to expose an adjacent area, this procedure being repeated until the entire target has been exposed.

REFERENCES:
patent: 3849659 (1974-11-01), O'Keefe
patent: 3887811 (1975-06-01), Livesay
patent: 4370554 (1983-01-01), Bohlen et al.
patent: 4469949 (1984-09-01), Mori et al.
patent: 4503334 (1985-03-01), King et al.
patent: 4528452 (1985-07-01), Livesay
patent: 4554458 (1985-11-01), Behringer et al.

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