Electron emissive film

Stock material or miscellaneous articles – Composite – Of inorganic material

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Details

427 78, 427122, 427249, 4272552, 427577, B32B 900

Patent

active

054397537

ABSTRACT:
A method for making an electron emissive film is provided. A substrate and a reaction chamber having a temperature and a pressure is provided. The temperature and the pressure are adjusted to a desired temperature and a desired pressure. A substrate is place into the reaction chamber with hydrocarbon gas being flowed into the chamber. A plasma is ignited in the reaction chamber so as to form a tetrahedral shaped compound in the reaction chamber which aids in deposition of an electron emissive material on the substrate.

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