Electron device using oxide semiconductor and method of...

Active solid-state devices (e.g. – transistors – solid-state diode – Semiconductor is an oxide of a metal or copper sulfide

Reexamination Certificate

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C257S072000, C257SE29273

Reexamination Certificate

active

07855379

ABSTRACT:
In an electron device in which plural thin film transistors each having at least a source electrode, a drain electrode, a semiconductor region including a channel, a gate insulation film and a gate electrode are provided on a substrate, a device separation region provided between the plural thin film transistors and the semiconductor region are constituted by a same metal oxide layer, and resistance of the semiconductor region is formed to be lower than resistance of the device separation region.

REFERENCES:
patent: 7189992 (2007-03-01), Wager, III
patent: 2003/0218222 (2003-11-01), Wager, III et al.
patent: 2007/0194379 (2007-08-01), Hosono
patent: 8-264794 (1996-10-01), None
patent: 2002-76356 (2002-03-01), None
patent: WO2005088726 (2005-09-01), None
patent: WO2005093846 (2005-10-01), None
patent: WO2005093847 (2005-10-01), None
patent: WO2005093848 (2005-10-01), None
patent: WO2005093849 (2005-10-01), None
patent: WO2005093850 (2005-10-01), None
patent: WO2005093851 (2005-10-01), None
patent: WO2005093852 (2005-10-01), None
Nikkei Microdevices, Feb. 2006, p. 73, Fig. 7.
Nomura et al., “Room-temperature fabrication of transparent flexible thin-film transistors using amorphous oxide semiconductors”, Nature, vol. 432, Nov. 25, 2004, pp. 488-492.
English Translation of Nikkei Microdevices, Feb. 2006, p. 73, Fig.7 (2 sheets).

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