Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Electron or ion source
Patent
1984-05-18
1987-01-20
Chatmon, Saxfield
Electric lamp and discharge devices: systems
Discharge device load with fluent material supply to the...
Electron or ion source
250427, 3133591, 315 39, 31511191, H01J 724, H05B 3126
Patent
active
046382160
ABSTRACT:
An electron cyclotron resonance ion source in which a plasma is confined in a magnetic configuration having a first group of coils located in the plane defined by the tight window of an ultra-high frequency injector and surrounding the latter, supplying the magnetic field creating and confining a plasma as well as a second group of coils supplied in counter-field compared with the first group and surrounding an ion extraction system. Ion extraction takes place in a magnetic field well below that corresponding to the cyclotron resonance. This ion source has numerous applications in the field of thin layer sputtering, microetching, ion implantation, accelerators, etc.
REFERENCES:
patent: 3418206 (1968-12-01), Hall et al.
patent: 3431461 (1969-03-01), Dodo et al.
patent: 3778656 (1973-12-01), Fremiot et al.
patent: 4045677 (1977-08-01), Humphries, Jr.
patent: 4393333 (1983-07-01), Sakudo et al.
patent: 4409520 (1983-10-01), Koike et al.
patent: 4417178 (1983-11-01), Geller et al.
patent: 4438368 (1984-03-01), Abe et al.
"Nuclear Instruments and Methods", vol. 196, May 1982, Amsterdam (NL), pp. 325-329.
"Nuclear Instruments and Methods", vol. 127, Aug. 1975, Amsterdam (NL), pp. 441-443.
"Japanese Journal of Applied Physics", vol. 11, No. 5, May 1972, Tokyo pp. 726-731.
Bourg Francois
Delaunay Marc
Geller Richard
Gualandris Rene
Jacquot Claude
Chatmon Saxfield
Commissariat a l''Energie Atomique
LandOfFree
Electron cyclotron resonance ion source does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Electron cyclotron resonance ion source, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Electron cyclotron resonance ion source will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2136622