Electron cyclotron resonance ion source

Details Electron cyclotron resonance ion source Electron cyclotron resonance ion source

1988-06-03

1989-11-28

Berman, Jack I.

Radiant energy

Ion generation

Field ionization type

250427, 3133601, 3133631, 31511181, H01J 3708

Patent

active

048839680

ABSTRACT:
An electron cyclotron resonance ion source for an ion implanter. The source includes an ionization chamber surrounded along its length by an electromagnet. A number of extraction electrodes at an output end of the ionization chamber allow positively charged oxygen ions to pass through apertures in the electrodes. The uniformity of the axially aligned magnetic field in the ionization chamber is extended through the extraction electrode by a magnetically permeable electrode and through use of non-magnetically permeable material to mount others of said electrodes.

REFERENCES:
patent: 4598231 (1986-07-01), Matsuda et al.
patent: 4703180 (1987-10-01), Taya
patent: 4714834 (1987-12-01), Shubaly
patent: 4782235 (1988-11-01), Lejeune et al.
patent: 4793961 (1988-12-01), Ehlers et al.
"Microwave Ion Source for Ion Implantation", by N. Sakudo.
"Very High Current ECR Ion Source for an Oxygen Ion Implanter", by Torii et al.

Affiliated with

Also associated with

Rating

Electron cyclotron resonance ion source does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Electron cyclotron resonance ion source, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Electron cyclotron resonance ion source will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-583974