Electron cyclotron resonance apparatus

Details Electron cyclotron resonance apparatus Electron cyclotron resonance apparatus

1994-02-04

1996-09-24

Dang, Thi

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

118724, 118723MA, 118723MR, H05H 1300

Patent

active

055587364

ABSTRACT:
An electron cyclotron resonance apparatus capable of achieving a cryogenic cooling effect. By a radioactive motion property of radicals, a side wall etch of a photoresist can be avoided in fabrication of next generation integrated micropatterns. The apparatus also eliminates conflicting increase/decrease phenomenons occurring between the etch rate and the anisotropy and between the etch rate and the uniformity in general etching equipments. This achieves not only a desired vertical etch, but also a rapid etch rate. As a result, it is possible to eliminate factors of causing a complexity in the process using a conventional triple-layer photoresist (TLR) or multilayer photoresist (MTR) and degrading the yield and the productivity.

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