Electron bombardment method for making stained glass photomasks

Details Electron bombardment method for making stained glass photomasks Electron bombardment method for making stained glass photomasks

1977-11-30

1979-03-13

Smith, Ronald H.

Gas separation: apparatus

Electric field separation apparatus

Electrode cleaner, apparatus part flusher, discharger, or...

65 30E, 96 362, 427 42, 427 43, 427300, 428 38, G03C 508, B05D 306

Patent

active

041440668

ABSTRACT:
Glass photomasks having a stained pattern within the glass for use in photolithographic processes are made by injecting stain-producing ions, preferably silver and/or copper ions, into a glass substrate from a film by electron bombardment, which also serves to reduce the injected ions to their elemental state and to agglomerate the atoms to colloidal coloration centers. The stained areas of the glass are patterned by carrying out the electron bombardment through a developed photoresist, or by using a focused electron beam moving along a controlled locus.

REFERENCES:
patent: 3484263 (1969-12-01), Kushihashi et al.
patent: 3515587 (1970-06-01), Letter
patent: 3516855 (1970-06-01), Goll et al.
patent: 3528847 (1970-09-01), Grego et al.
patent: 3585091 (1971-06-01), Lepselter
patent: 3837884 (1974-09-01), Rheinberger
patent: 3864194 (1975-02-01), Shibata et al.
patent: 3994727 (1976-11-01), Polichette et al.

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