Radiant energy – Luminophor irradiation
Patent
1997-09-05
1999-03-23
Anderson, Bruce
Radiant energy
Luminophor irradiation
250397, H01J 37302
Patent
active
058863575
ABSTRACT:
In an electron-beam writing system comprising an electron gun for radiating an original electron beam along an electron gun axis, a first aperture member for shaping the original electron beam into a primary shaped electron beam, and deflecting means for deflecting the primary shaped electron beam from the electron gun axis to produce a deflected electron beam, and a second aperture member for shaping the first deflected electron beam into a secondary shaped electron beam, the second aperture member has a plurality of secondary apertures which include at least one rectangular beam-size adjustment aperture having a known design size. The secondary apertures may include a plurality of rectangular beam-size adjustment apertures having longitudinal and lateral dimensions either which vary at a constant ratio.
REFERENCES:
patent: 5404019 (1995-04-01), Ohno et al.
patent: 5438207 (1995-08-01), Itoh et al.
patent: 5468969 (1995-11-01), Itoh et al.
patent: 5712488 (1998-01-01), Stickel et al.
Y. Nakayama, et al., "Electron-beam cell projection lithography: A new high-throughput electron-beam direct-writing technology using a specially tailored Si aperture", J. Vac. Sci. Technol. B., vol. 8, No. 6, Nov./Dec. 1990, pp. 1836-1940.
Anderson Bruce
NEC Corporation
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