Electron beam writing system

Details Electron beam writing system Electron beam writing system

1992-05-19

1995-02-07

Berman, Jack I.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

250396R, 250396ML, G21K 1093

Patent

active

053877993

ABSTRACT:
An electron beam writing system which permits a relatively low voltage to be applied to perform high speed focus correction with high accuracy. The electron beam writing system includes a focus corrector arranged inside a lens which provides the largest product of the magnification factors of the lens and all succeeding lenses and the optical path length of the lens at issue. Thus, the electron beam provides high sensitivity and a small change in the magnification ratio due to the correction.

REFERENCES:
patent: 4075485 (1978-02-01), Lijewski et al.
patent: 4701620 (1987-10-01), Okumura et al.
patent: 5099133 (1992-03-01), Yamada
patent: 5136167 (1992-08-01), Langner et al.
patent: 5168166 (1992-12-01), Hayakawa et al.
patent: 5283440 (1994-02-01), Sohda et al.
Proceedings of Autumn Meeting of Japan Society of Precision Engineering, (1987), pp. 565-566.
J. Vac. Sci. Technology, B9(6), Nov./Dec. 1991, pp. 2940-2943.

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