Electron beam writing method, fine pattern writing system,...

Details Electron beam writing method, fine pattern writing system,... Electron beam writing method, fine pattern writing system,...

2011-07-05

2011-07-05

Kim, Robert (Department: 2881)

Radiant energy

Irradiation of objects or material

Ion or electron beam irradiation

C360S051000, C360S077080, C250S3960ML

Reexamination Certificate

active

07973297

ABSTRACT:
When writing a hard disk pattern on a substrate applied with a resist by scanning an electron beam on the substrate while rotating a rotation stage, writing is started with respect to each radial direction position of each area based on a predetermined encoder pulse for each radial direction position among those generated according to the rotational angle of the rotation stage that occurs after a predefined encoder pulse that occurs ahead in a rotational direction of a radial direction position whose write start position in a circumferential direction in each area arrives first at the writing position as the rotation stage rotates and ahead of the write start position in the circumferential direction with respect to each radial direction position, and after a predetermined time from the predetermined encoder pulse.

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patent: 6738205 (2004-05-01), Moran et al.
patent: 6954323 (2005-10-01), Deeman et al.
patent: 7218470 (2007-05-01), Deeman et al.
patent: 2006-184924 (2006-07-01), None
patent: 2006184924 (2006-07-01), None

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