Electron beam writing equipment and electron beam writing...

Details Electron beam writing equipment and electron beam writing... Electron beam writing equipment and electron beam writing...

2006-05-23

2006-05-23

Wells, Nikita (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

C250S492100, C250S310000

Reexamination Certificate

active

07049607

ABSTRACT:
Electron beam writing equipment has an electron source and an electron optics system for scanning an electron beam emitted from the electron source on a sample via deflection means having at least two different deflection speeds. An objective lens is used to form a desired pattern on the sample The electron beam is moved by high speed scanning with the deflection means to repeat formation of a patterned beam. The electron beam is moved on the mark for beam correction by low speed scanning with the deflection means in synchronization with one cycle of the repetition. The position or the deflection distance of the electron beam or blanking time is corrected using detectors for back scattered or secondary electrons.

REFERENCES:
patent: 5578821 (1996-11-01), Meisberger et al.
patent: 5834783 (1998-11-01), Muraki et al.
patent: 6566885 (2003-05-01), Pinto et al.
patent: 2002/0148961 (2002-10-01), Nakasuji et al.
Journal of Vacuum and Technology, B12, 1992, Sakitani et al, pp. 2759-2763.
Journal of Vacuum and Technology, B5, 1987, Iwadate et al, pp. 75-78.

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