Electron beam type pattern transfer apparatus

Radiant energy – Irradiation of objects or material – Ion or electron beam irradiation

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Details

250398, 2504611, A61K 2702, G01N 2164

Patent

active

043663834

ABSTRACT:
An electron beam type pattern transfer apparatus has a photoelectric mask and a sample in a vacuum container made of non-magnetic material. The photoelectric mask is adapted to receive an ultraviolet ray from a light source and emit photoelectrons corresponding to a predetermined transfer pattern and the sample is disposed in parallel with the photoelectric mask with a predetermined distance left therebetween and illuminated with the photoelectrons to form a resist image thereon which corresponds to the transfer pattern. A power source for applying a voltage for accelerating the photoelectrons emitted is connected between the photoelectric mask and the sample. A pair of focusing magnets are disposed around the axis of the vacuum container such that they are located one at one outer side and one in an opposite outer side of the vacuum container to permit a vertical magnetic field to be created between the photoelectric mask and the sample. The focusing magnets have superconductive coils and are driven in a persistent mode.

REFERENCES:
patent: 3519873 (1970-07-01), O'Keefe
patent: 3551734 (1970-12-01), O'Keefe et al.
patent: 3745358 (1973-07-01), Firtz et al.
patent: 4227090 (1980-10-01), Amboss
"Integrated Circuit--by Livesay, J. Vacuum Sci. Technology, vol. 10, No. 6, 1973, pp. 1028-1032.

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