Image analysis – Applications – Manufacturing or product inspection
Patent
1997-01-10
1998-10-20
Boudreau, Leo
Image analysis
Applications
Manufacturing or product inspection
382296, 348 95, G21K 100
Patent
active
058259120
ABSTRACT:
An Electron Beam Tester which corrects deformation of a secondary electron image produced from scanning a sample with an electron beam. The secondary electron image is stored in a storage unit. Luminance data of the stored image is accumulated to obtain a projected luminance distribution. The projected luminance distribution data is then analyzed by a parallelism evaluation unit to obtain a rotation angle. Then the rotation angle is used to determine maximum parallelism and correct deformation of the secondary electron image by providing deflection control which transforms the deflectors .
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Ito Akio
Okubo Kazuo
Teguri Hironori
Boudreau Leo
Fujitsu Limited
Kelley Chris
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