Radiant energy – Irradiation of objects or material – Ion or electron beam irradiation
Patent
1993-05-14
1995-01-03
Berman, Jack I.
Radiant energy
Irradiation of objects or material
Ion or electron beam irradiation
250435, 2041573, B01J 1908
Patent
active
053788982
ABSTRACT:
An electron beam source or generator is described for the treatment of toxic materials in a treatment system in which electron beams are reacted with a flowing influent in a reaction chamber. The system is modular allowing different configurations as demanded by the site and by the clean-up job. It is also portable in that it can be easily moved from place to place. If mounted on a movable base it can be taken from place to place for use.
REFERENCES:
patent: 2583899 (1952-06-01), Smith
patent: 2892946 (1959-06-01), Dewey, II et al.
patent: 2958638 (1960-11-01), Tarmy
patent: 4294674 (1981-10-01), Aoki et al.
patent: 4372832 (1983-02-01), Bush
patent: 4507265 (1985-03-01), Higo et al.
patent: 4595569 (1986-06-01), Reuter et al.
patent: 4596642 (1986-08-01), Higo et al.
patent: 4702808 (1987-10-01), Lemelson
patent: 4752450 (1988-06-01), Dietrich et al.
patent: 4882020 (1989-11-01), Maezawa et al.
patent: 4915916 (1990-04-01), Ito et al.
patent: 4969984 (1990-11-01), Kawamura et al.
patent: 5015443 (1991-05-01), Ito et al.
patent: 5219534 (1993-06-01), Reynolds
patent: 5256854 (1993-10-01), Bromberg et al.
Matthews et al. Decomposition of Halogenated Hydrocarbons using Intense, Pentrating Bremstrahlung Radiation Phys. Chem. vol. 42 Nos. 4-6 pp. 689-693 Pergamon Press Released by Pergamon on Jun. 16, 1993.
Fadness David R.
Schonberg Peter R.
Schonberg Russell G.
Berman Jack I.
Cole Stanley Z.
Zapit Technology, Inc.
LandOfFree
Electron beam system does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Electron beam system, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Electron beam system will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2212813