Electron beam system

Details Electron beam system Electron beam system

1979-09-13

1981-04-21

Anderson, Bruce C.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

250398, H01J 37147

Patent

active

042635144

ABSTRACT:
Electron beam lens 22 can be operated in a first mode to demagnify and focus the image of electron source 14 at image plane 32. Electron optical lens 34 and 46 further demagnify the image plate 32 through the focal point 60 on the face of target 58 to provide a scannable exposure spot. Electron optical lens 22 can be operated in the second mode which floods aperture 32 so that the image of the aperture is demagnified and focused on target 58 to provide a large exposure area.

REFERENCES:
patent: 3956635 (1976-05-01), Chang
patent: 3978338 (1976-08-01), Ueno
patent: 4013891 (1977-03-01), Ko et al.
patent: 4112305 (1978-09-01), Goto et al.

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