Coating apparatus – Gas or vapor deposition – Running length work
Patent
1983-04-18
1985-06-25
Smith, John D.
Coating apparatus
Gas or vapor deposition
Running length work
118726, 219121EE, 219121EV, C23C 1310
Patent
active
045247170
ABSTRACT:
The present invention is a coating apparatus for temperature-sensitive broad strips or similar substrates. To obtain a high quality of coating, it is necessary to minimize the path of the electron beam (EB) through the vapor cloud, and to keep away backscattered electrons from the evaporating material. According to the invention, this problem is solved by assembling a sector field with a vertical field direction at the deflection system connected with the EB gun, which is followed by a deflection field with a horizontal field direction. The divergent electron beam is guided in lines to the evaporating material by the geometry of the fields.
REFERENCES:
patent: 3303320 (1967-02-01), Muller
patent: 3394217 (1968-07-01), Fisk
patent: 3432335 (1969-03-01), Schiller et al.
patent: 3562141 (1971-02-01), Morley
patent: 3931490 (1976-01-01), Grothe et al.
patent: 4061871 (1977-12-01), Sommerkamp et al.
Jasch Gunter
Morgner Henry
Neumann Manfred
Schiller Siegfried
ZeiBig Gerhard
Bakish Materials Corp.
Plantz Bernard F.
Smith John D.
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